CVPR · 2023 · Conference paper

Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters

James Seale Smith, Yen-Chang Hsu, Zsolt Kira, Yilin Shen, Hongxia Jin

Samsung (United States) · Research!America (United States) · Georgia Institute of Technology

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Published in
2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops (CVPRW)
Date
2024-06-17
Citations
12
arXiv
2311.18763
Cite
@inproceedings{smith2023continual,
  title = {Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters},
  author = {James Seale Smith and Yen-Chang Hsu and Zsolt Kira and Yilin Shen and Hongxia Jin},
  year = {2023},
  booktitle = {2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops (CVPRW)},
  eprint = {2311.18763},
  archivePrefix = {arXiv},
  doi = {10.1109/CVPRW63382.2024.00181},
  url = {https://arxiv.org/abs/2311.18763},
}