Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters
Samsung (United States) · Research!America (United States) · Georgia Institute of Technology
- 2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops (CVPRW)
- 2024-06-17
- 12
@inproceedings{smith2023continual,
title = {Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters},
author = {James Seale Smith and Yen-Chang Hsu and Zsolt Kira and Yilin Shen and Hongxia Jin},
year = {2023},
booktitle = {2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops (CVPRW)},
eprint = {2311.18763},
archivePrefix = {arXiv},
doi = {10.1109/CVPRW63382.2024.00181},
url = {https://arxiv.org/abs/2311.18763},
}