CVPR · 2023 · Conference paper

Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters

J. Smith, Yen-Chang Hsu, Z. Kira, Yilin Shen, Hongxia Jin

Published in: 2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops (CVPRW)
Date: 2023-11-30
Citations: 12
arXiv: 2311.18763 ↗

Cite

@inproceedings{smith2023continual,
  title = {Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters},
  author = {J. Smith and Yen-Chang Hsu and Z. Kira and Yilin Shen and Hongxia Jin},
  year = {2023},
  booktitle = {2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops (CVPRW)},
  eprint = {2311.18763},
  archivePrefix = {arXiv},
  doi = {10.1109/CVPRW63382.2024.00181},
  url = {https://arxiv.org/abs/2311.18763},
}